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OXFORD

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Plasmalab 80 Plus

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OXFORD

Plasmalab 80 Plus

PECVD System Gases: SiH4, NH3, N2O, N2, CF4 2005 vintage.

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인기상품

OXFORD

Plasmalab 80 Plus

PECVD System, 4"-6" Deposition: SiO2 Dep, SiH4 at 300°C No burner gas abatement EDWARDS E2M80 Vacuum

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OXFORD

Plasmalab 80 Plus

System Blanking plate has been removed.

179

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OXFORD

Plasmalab 80 Plus

System Missing parts: Gasbox PC.

181

인기상품

OXFORD

Plasmalab 80 Plus

PECVD System.

150

인기상품

OXFORD

Plasmalab 80 Plus

Plasma Enhanced Chemical Vapor Deposition (PECVD) System, 8" Diameter electrode: 460 mm, 4"-12" Cham

233

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OXFORD

Plasmalab 80 Plus

Reactive Ion Etcher (RIE) / PECVD Systems, parts system.

188

인기상품

OXFORD

Plasmalab 80 Plus

Reactive ion etch system With LEYBOLD 30324T vacuum pump Software not included Voltage: 208V.

193

인기상품

OXFORD

Plasmalab 80 Plus

Plasma Enhanced Chemical Vapor Deposition (PECVD) system.

인기상품

OXFORD

Plasmalab 80 Plus

PECVD Systems.

인기상품

OXFORD

Plasmalab 80 Plus

ICP System, 8".

인기상품

OXFORD

Plasmalab 80 Plus

Reactive Ion Etcher (RIE) / PECVD System.

156

인기상품

OXFORD

Plasmalab 80 Plus

Plasma Enhanced Chemical Vapor Deposition (PECVD) system.

183

인기상품

OXFORD

Plasmalab 80 Plus

System.

165

인기상품

OXFORD

Plasmalab 80 Plus

System.

147

인기상품

OXFORD

Plasmalab 80 Plus

PECVD System Optional: Dual frequency deposition Turbo pump.

164