PERKIN ELMER 4450

판매하고자하는 장비에 대한 정보를 입력하면 CAE가 귀하에게 연락하여 해당 품목을 구입합니다.

장비 세부 정보 웨이퍼 크기, 치수, 공정, 챔버 수 등과 같은 기술 사양 PERKIN ELMER 4450 Sputtering system Specifications: Three cathode, load lock, sputter down type system Stainless steel process chamber fully shielded Stainless steel load-lock chamber Table drive assembly with a precision motor for rotation Sputtering top head assembly can accommodate up to three Delta type cathodes or with adapter plates other types of cathodes RF and DC magnetron cathodes are available Substrate table is water cooled and can be biased for RF etch or biased during the sputtering deposition process MFC gas flow control system (1) each 1 torr full scale capacitance manometer Substrate heating can be offered as an option Process chamber is pumped by model CTI-8 Cryo pump and compressor Mechanical pump Spare parts list Optional turbo pumped Load lock is available. 자세한 내용은보다 정확한 추천을 유도합니다. * 필수 입력란 연락처 정보