판매용 중고 FHR Line 1100 V7 #9257514

Inline sputtering system Deposition of dielectric coatings: 7° front side Modules: Module 1: Loading station Module 2: Input load lock Module 3: Buffer chamber 1 Module 4: Buffer chamber 2 Module 5: Sputtering pseudo reactive Module 6: Gas separation buffer chamber Module 7: Sputtering reactive Module 8: Output load lock Module 9: Unloading station Substrate load / Unload module using (2) KUKA robots Vacuum: End pressure: ≤2 x 10^-6 mbar after 8 hours End pressure: ≤1.5 x 10^-6 mbar after 12 hours Chambers: Stainless steel vacuum chamber Powder coated mild steel chamber frame Pneumatic gate valves Modules includes: Turbo molecular pump: DN 250 ISO-K View port: DN 100 Front service flange Flap valves VAT Rotary dry pump: 300 m³/h and 250 m³/h Roots pump: 1000 m³/h 1900 Is^-1 for N2 and ca 1400 I/s for N2 Gate valves DN 250 Meissner trap with cryo generator (6) Pirani gauge fore vacuum sensors: 1000 mbar-10^-3 mbar (8) Penning high vacuum sensors: 10^-3 mbar-10^-8 mbar (13) Baratrons MKS 627: 10^-1 mbar-10^-4 mbar Upstream pressure regulation Atmospheric pressure sensors Heater vacuum gauges Reserve flanges Rotatable sputtering cathodes: (8) TiOx cathodes SCI MC End block Target length: 43" Backing tube diameter: 5" Target substrate distance: 4" Gas admission system: MFC for Ar each sputtering source Gas lines for 5N purity (4) MF Bipolar power supplies Control and visualization: PC Surface Operating system: Windows 7 Professional PLC General control Cooling water: Power supplies Cathode Cathode surrounds cooled by water loops Power supplies: Aggregate connection: 3 / N / PE AC 380 V / 50 Hz 24 V.