판매용 중고 CPA / KURDEX 9900 #9116667

Sputtering system Entry / Exit load lock: CPA Chamber CPA Load lock valve Load lock chamber, 13.125” Single pallet operation Substrate, 12” x 12” SST Pallet, 15.5”x14” GP-303 Ion gauge controller Pallet sensors Load / Unload station Process chamber: CTI CT-8 Cryo pump VAT Hivac valve MKS Throttling valve CTI 8500 Compressor GP-303 Ion gauge controller (2) Gas system with VCR gas lines (2) NUPRO Isolation valves (2) MKS MFCs for Ar, O2 Chain drive transport system (2) AE Pinnacle+, 10kw dc power supplies (1) CPA Process chamber: (2) CPA 4.75”x15” DC magnetron Assemblies: (2) Sets of target shielding Control system: Opto-22 PLC, monitor Manual & auto control modes Recipe control I/O Wiring Ul Approved power box with EMO CPA Optical pallet sensing system With controller & sensors Process parameter control ranges: Sputtering pressure: 5 - 30 Microns Conveyor speed: 0.1 - 80 cm.min. D.C Deposition power level: 100 - 9000 watts R.F Deposition power level: 50 - 3000 watts R.F Sputter clean power level: 15 - 1000 watts Substrate heating: Ambient to 350°C Uniformity performance: Etch: ±10% Deposition: R.F Magnetron ±10% D.C Magnetron ±5% Vacuum performance: Ultimate pressure 2 x 10(-7) in 16 hrs 5 x 10(-7) in 30 minutes Rate of rise: 1 x 10(-4) 6 minutes Vacuum tight: Less than 5 x 10(-10) standard atmosphere cc helium/second Utility requirements: 4-Wire delta or 5 wire wye Water temperature: 50 - 75°F (10-24°C) Air: 70 to 100 PSIG (6 to 8 ATU) filtered, 1 CFM Sputtering gas: Typically 5 PSIG (1.3 ATU) Argon Options: Sputter etch CPA Etch table assy AE Matching network RF Switching assy AE RF generator Sputter area mod, 24" RGA: LEYBOLD Transpector Installed with isolation valve Substrate heater: Process chamber Heater assy Contoller Wiring Power: 208 V, 50/60 Hz, 3 Phase, 100 A.