판매용 중고 TEL / TOKYO ELECTRON Clean Track Mark 8 #9165442

(2) Coater / (2) Developer system, 8" Single block Open cassette Interface for NIKON NSR 2205 EX14C Silicon substrate wafer Wafer flow: Left to right CSB Unit at right Interface station unit at left (2) Process blocks: Single block system Cassette station block (CSB): FC-9821KE Controller Stage / Indexer: Non SMIF / Open uni-cassette Cassette station (CS) Cassette station arm (CSA) Process station block (Spin units): 2-1 Standard photo resist coat unit: (3) Photo resist dispense nozzles (3) IWAKI Bellows pumps Solvent pre-wet reduced resist coat (RRC) nozzle Side rinse nozzle (Programmable side rinse EBR) Dual back rinse nozzles Photo resist temperature control Motor flange temperature control Photo resist drain type: Direct gravity drain type Auto dummy dispense system installed Photo resist bottle: (6) External chemical supply system 2-2 Anti-reflection coat unit: (3) Photo resist dispense nozzles (3) IWAKI Bellows photo resist pumps Solvent pre-wet reduced resist coat (RRC) nozzle Side rinse nozzle (Programmable side rinse EBR) Dual back rinse nozzles Photo resist temperature control Motor flange temperature control Photo resist drain type: Direct gravity drain type Auto dummy dispense system installed Photo resist bottle: (6) External chemical supply system 2-3 and 2-4 Develop units: (4) Stream nozzle blocks (4) Stream nozzles (2) Rinse nozzles: Stream type Dual back rinse nozzles Develop temperature control Motor flange temperature control Drain type: Direct gravity drain type Auto damper Auto dummy dispense system Process block robotics arm (PRA) Adhesion unit (10) Hot plate oven units (2) Air-purge hot plate (AHP) oven units (7) Cool plate units Wafer edge exposure (WEE) unit Interface station block (IFB): Interface arm (IFA) (2) Buffers Pick-up system Interface cool Extension stage Wafer stage Temperature and humidity controller: SHINWA T&H-CPC 2-Cup control capacity for (2) Coat units External chemical supply system: Solvent supply system for (2-1) COT and (2-2) ARC: Solvent chemical type Bulk-fill central chemical supply (CSS) type With (2) 3-Liter teflon buffer tanks Develop supply system for 2-3 and 2-4 Develop units: Develop solution chemical type Bulk-fill central chemical supply (CSS) type With (2) 3-Liter teflon buffer tanks (2) Photo resist supply systems: 6-Bottles of manual supply type Auto switch-off / Exchange installed HMDS Supply system: HMDS Chemical type Bulk-fill central chemical supply (CSS) type With 3-Liter teflon buffer tanks for AD unit External chemical supply system / Cabinet: (2) SMC Multi thermo controller units SMC Circulator pumps and thermo controller With 7-Channels: 2-1 COT 2-2 ARC Motor flanges: 2-1 COT and 2-2 ARC 2-8 COL 2-12 COL 2-16 COL 2-19 COL SMC Circulator pumps and thermo controller With 7-Channels: 1 and 3 Stream nozzle blocks: 2-3 2 and 4 Stream nozzle blocks: 2-4 (2) Motor flanges at 2-3 and 2-4 DEV 2-20 COL 2-23 COL 2-24 COL 3-4 I/F COL (3) Robots: CS Arm Main arm robots Interface arm Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz 1997 vintage.