판매용 중고 SVG 86-3 #117943

SVG 86-3
제조사
SVG
모델
86-3
ID: 117943
웨이퍼 크기: 3"
single cabinet developer system, 3" Configuration: Wafers: 3" round Silicon wafers, convertible up to 6" with kit option Process flow: left to right Track 1: send, bake, chill, MD develop, bake, chill, with flood expose, receive Track 2: send, HMDS vapor prime, chill, coat, bake, bake, chill, receive System specifications: Frame: Internal frame: standard powder coated black External panels: stainless steel System: Emergency stop access in front of system Rear system bulkhead fittings and facility connections: Process chemicals: EBR solvents, developer, DI water Process gasses: clean dry air, Nitrogen Process exhaust Cooling water System transport: O-ring belt transfer Polyurethane Silicone Viton Serial processing Indexer module: Platform designed for SEMI standard 3" wafer cassettes Hard anodized aluminum Standard 3" SEMI standard cassette pitch indexing Capable of handling up to 6" SEMI standard wafer cassettes Photoresist coat module: Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) Photoresist nozzle (3) Topside EBR TEFLON catch cup with built-in backside EBR Pre-dispense cup with programmable pre-dispense Digital vacuum switch Interlocked safety cover to stop process when removed Center collection 1 gallon polyethylene drain container, high level sensor 5-gallon SS canister with low level sensing for EBR solvent dispense Positive resist moving dispense developer module (aqueous) Arc centering configured for 3" round silicon wafers Brushless motor: 1 RPM spin speed programmability up to 6,000 RPM Programmable pivoting moving dispense arm: (1) 1/4” O.D. developer nozzle (1) 1/4” O.D. DI water rinse nozzle (1) SS11001 developer spray nozzle (1) SS11001 DI water rinse nozzle Polyethylene catch cup with built-in arm home positioning off wafer Digital vacuum switch Interlocked safety cover to stop process when removed 2" Polyethylene drain to rear of system for facility connection 5-gallon SS canister with low level sensing for aqueous developer Chill plate module: Hard anodized aluminum surface Internal water channels for high efficiency heat transfer 3/8" Swagelok tubing input and output connections Hotplate oven module: Hard anodized Aluminum 3-pin HPO block assembly 3-pin stepper motor programmable wafer lift handling Enhanced heating element (Std. 120V, 450W) Optional enhanced heating element (High Temp. 120V, 750W) WATLOW temperature controller Auto tuning +/- 0.1% calibration accuracy Temperature range: 50ºC to 250ºC (Standard) Temperature range: 80ºC to 350ºC (High Temp.) Temperature uniformity: +/- 0.5ºC (at 100 ºC) Digital LED display Temperature readout to 0.1ºC RTD temperature probe Digital vacuum switch NetTRACK system manager: NetTRACK CPU board Industrial PC Multitasking Windowsxp application software HCIU card cage connection port NetTRACK system management software Recipe management Unlimited recipe writing Easy editing and copying Component exercise Real-time display of process set points Real-time processing data logging Four access security levels with password control Seamless integration with production server Configurable for all process steps SECS-GEM compliant ports print out in MS Excel format 15” ELO color touch-screen, 1024 x 768 resolution at 75 Hz Ergotron monitor arm, (angles and height adjustable, SEMI compliant) Emergency stop button front Main breaker on power distribution box Barcode reader Flood exposure: Configured for 3" wafers (4" shutter opening) Lamp: 350W Wavelength: 365 nm Intensity range: 18mW to 24mW Module mounted on developer chill plate Exposure interface board to system software control Facilities requirements: Power (system): 208V, 3-phase, 60Hz, 5-wire, 35A Power (chiller): 120V, 1-phase, 60Hz, 3-wire, 15A Vacuum: 5 SCFM at 28" Hg, 3/8" OD tube Gas (CDA): 70 to 100 psig, 10 SCFM per system, 1/4" OD tube Gas (N2): 80 to 100 psig, 10 SCFM per system, 3/8" OD tube Process exhaust (coater/developer): 35 SCFM at 1.5" H2O/module, 4" duct Process exhaust (HPO): 10 SCFM at 1.5" H2O/module, 4" OD duct Cabinet exhaust (optional): 150 SCFM at 1.5" H2O, 4" OD duct Facilities connections: back of system System transport and installation: Transport: 4 wheels Securing: screw type mounting feet with pads Dimensions (W x D x H): 108 x 40 x 48" Options available for an additional cost: (Qty 4) IntelliGen Mini Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 2) IntelliGen HV Photoresist dispense systems: 2-Stage Steppor motor technology and diaphragm design Filter Mounting bracked Interface cables (Qty 4) 451-15-1-S IDS 1/4 x 1/4 units with suckback valves: Bushings and compression nuts for input and output connections (1) output 0 to 15 PSI pressure For resist (0-80cp), Barli, and ARC (0-80cp) Power supply Interface cables Software (Qty 2) CYBOR 7500 precision chemical dispense pumps: Mid-range viscosity: 300 cp to 3000 cp 3/8" Flare-type connections KALREX O-rings Variable rate dispense High-torque stepper motor control Dispense volume: maximum 16ml Programmable suckback Multiple recipe select On-board single-pump controls RS232, RS485, LON communications Power supply Interface cables Software Chill plate closed loop temperature control unit: Connection tubing Can be shared with more than one chill plate Developer temperature control unit: Closed loop recirculation heater / chiller Manifold and connection tubing to dispense arm Single temperature delivered to dispense arm Electro-polished 5-gallon SS solvent canisters, low-level sensing Dual chemistry developer dispense system.
SVG 86-3은 인쇄 회로 기판에서 고품질의 고해상도 패턴을 만드는 데 사용되는 양성 포토리스 (photoresist) 장비입니다. 그것 은 단일 성분 "시스템 '으로서, 액체 광사제 와 촉매제 로 구성 되어 있으며, 이것 은 별도 의" 컨테이너' 에 저장 되어 있다. 포토 esist는 diazonaphthoquinone (DNQ) 형 novolak이며, 촉매제는 아민 기반 촉매이다. 자외선 또는 다른 형태의 방사선에 노출 될 때, 86-3 액체 광 물질은 촉매와 라디칼 커플 링 반응을 겪으며, 결국 3 차원 폴리머 구조를 형성한다. 고분자는 많은 일반적인 용매에 녹지 않으며, 화학 및 에치 공정에 매우 내성이 있습니다. 이것은 매우 미세한 해상도의 패턴을 만들어 SVG 86-3 장치를 마이크로 피치 (microfabrication) 및 미세 피치 (fine-pitch), 고품질 제조 공정에 사용하는 데 이상적입니다. 구리, 알루미늄, 유리, 세라믹 및 실리콘과 같은 다양한 기질에 86-3 광 esist 기계를 직접 적용 할 수 있습니다. 일단 노출 되면, 광물질 을 개발 하여 염화 "페릭 '또는" 칼륨' 과망간산염 과 같은 다양 한 에친트 로 에칭 할 수 있다. 이러 한 "에칭 '과정 이 끝나면, 원하는" 패턴' 이 기판 위 에 남아 있고, 무정부 한 광물질 을 물 속 에서 씻어내거나 적합 한 용매 로 씻을 수 있다. SVG 86-3 포토 esist 도구는 일반적으로 반도체 장치, 인쇄 회로 기판 및 프로브 제조, 레이저 설계, 의료 기기 응용 프로그램 및 의료 진단에 사용됩니다. 고해상도 이미지 형성과 생성 된 폴리머의 화학 저항은 86-3 에셋을 가장 우수하고 가장 다재다능한 양성 포토 레스트 (photoresist) 중 하나로 만듭니다.
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