판매용 중고 AG ASSOCIATES 4100 #9146374

Rapid thermal processors (RTP), 3"-6" Includes: Heating chamber: Two high intensity tungsten-halogen lamp arrays System controller Quartz isolation tube Robot Gas-control electronics ULAP Filtration-system Graphic user interface (GUI) computer system Electronics Mass-flow-controlled gas handling Cooling ULPA Filtration Mechanical assemblies Extended range pyrometer (ERP) Recipe storage: 3-1/2" Floppy disk-drive Options: Non contact wafer aligner Susceptor autoloader E-SECS Slip free Dual-color pyrometer Applications: Silicon dielectric growth Implant annealing Glass re-flow Silicide formation and annealing Nitridation of metals Contact alloying Oxygen donor annihilation Standard cassettes Wafer handling: Automatic serial processing Throughput: Process dependent Ramp-up rate: Programmable Range: 1 – 180°C Per second Steady-state duration: 1 – 600 Seconds per step Ramp-down rate: Programmable Temperature Radiation dependent Range: 1 – 180°C Per second Maximum: 150°C per second Recommended steady-state temperature range: 400 – 1200°C ERP Temperature accuracy: +5°C to -9°C Calibrated against an instrumented thermocouple wafer (ITC) Temperature repeatability: + 7°C Temperature uniformity: + 10°C Includes: Manuals.