판매용 중고 VARIAN E1000HP #9232479

High current implanter, 8" Enhance type Carriage motor type: N6 Motor Turbo (VT250) end station pump High-pressure gas EDWARDS QDP80 Terminal dry pump EDWARDS QDP80 Chamber dry pump VARIAN V1800 Source turbo pump (4) CTI 250F Chamber cryo pumps Chamber cryo pump option Main power / Frequency: 280 PD / 208 PD Auto top utility supply Type: PFG Cusp source assy Type: Hook site Y2K Completion Hi-voltage probe Signal tower Energy: Operational: 2 ~ 200 keV B+: 10~200 keV, As+ P+: 40~200 keV Stability: ±10% After warm up Dopant species: 11B+, 49BF₂+, 75As+, 31P+, 121Sb+ Implant dose accuracy: Specification range: 5E11-5E16 Uniformity (At 7° Tilt angle): 1δ ≤0.5% Repeatability (At 7° Tilt angle): 1δ ≤0.7% Wafer charge neutralization: Plasma flood gun with interlocks on current Gas flow rate & beam spot size Wafer handling: Horizontal loading Slot-to-slot integrity Backside pick and place (75) Wafer loads (3) Independent vacuum load locks Dummy wafer handling capability Throughput: Mechanical Limit/30 sec implant at 7° tilt 1D Profiler (Wafer per hour): 230 / 210 Wafers per disc: 18 / 13 Process angles: Tilt: +7 / -7° Twist: 0°-360° ±2° Automatic recipe control Wafer cooling: ≤100° C at 3000 Watts Wafer breaks: 1:20,000 Particulate control: ≥0.2 um Particles ≤0.15 Added per cm² (Mean value) Utility: N2: 50~100 psi Size: 3/8" NPT Air: 90~125 psi Size: 3/8" NPT PCW: 40~100 psi (In/Out) Size: 3/4" NPT Temperature: 10~20° C Exhaust: Toxic: 34000 PVC, 5" (2) PVC, 8" NW40 Power: 460/445/415/380 V, 65/70/75/80 kVA, 3 Phase, 4 wires.