loading

2002 results for found: 익숙한 Mask Aligners

1 2 3 4 5 6 다음 것
  • AB MANUFACTURING: AB-M 60

    AB MANUFACTURING AB-M 60 UV mask aligner and exposure system designed to operate in the UV at either 365nm or 400nm.
  • AB MANUFACTURING: AB-M 60

    AB MANUFACTURING AB-M 60 UV mask aligner and exposure system Designed to operate in the UV at either 365nm or 400nm.
  • AB MANUFACTURING: AB-M 3HR

    AB MANUFACTURING AB-M 3HR mask aligner.
  • AB MANUFACTURING: AB-M 60

    AB MANUFACTURING AB-M 60 UV mask aligner and exposure system Designed to operate in the UV at either 365nm or 400nm.
  • AB MANUFACTURING: AB-M 60

    AB MANUFACTURING AB-M 60 UV mask aligner and exposure system Designed to operate in the UV at either 365nm or 400nm.
  • ABM: -

    ABM - Mask aligner.
  • ABM: -

    ABM - Mask aligner.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
  • ABM: ALIGNER

    ABM Aligner Photo aligner, 4"-6" Front and back alignment Full CCD front and back alignment 2 um Node / 1 um features Full contact alignment possible Vibration isolation table available.
  • ABM: -

    ABM - Mask aligner, 8" W/O Multi-level optics Reliable mask alignment Exposure system delivers accurate Repeatable operation Flexibility require Accommodate wide range of materials Processes from odd sized substrates Small piece parts With exposures in Near UV Mid UV and Deep UV Fixed level or planarizing (Wedge compensation) vacuum chucks Low magnification single-field stereo zoom microscopes to low / high magnification single Splitfield microscopes with CCTV or Dual CCD alignment systems for visible / infrared alignment Single level system 2000 vintage.
  • ABM: -

    ABM - Mask aligner.
  • ABM: -

    ABM - Mask aligner.
  • ABM: CUSTOM

    ABM Custom Mask aligner, 8" Zeiss high resolution mask alignment microscope 500 Watt UV power supply Top and backside alignment Table-top configuration Adjustable vacuum contact Precision alignment module for piece parts up to 8" Square, .005" to .3" Thick Top (2" to 10") and Bottom (2" to 8") vacuum mask holders Fixed level or Wedge compensation vacuum chucks Uniform / Collimated exposure beams, Near UV, Mid UV, Deep UV 2-Channel 200 To 2,000 Watt intensity controlling power supplies Splitfield CCD/TV alignment systems / microscopes Single Field Zoom & High Magnification Microscopes Standard support and vibration isolation tables.
  • ABM: -

    ABM - Reliable mask alignment and exposure system, 8" Wafer vacuum chuck, 8" 9" x 9" Top load mask holder Not included: Alignment optics Alignment module: Vacuum chuck motions: X,Y, Z and theta Z Motion travel: .250 inches Proximity adjust: Adjustable in 2.5 micron increments Mask rotation (manual motion): Up to 90 degree Mask sizes: Interchangeable up to 9"x 9" Mask frame assembly: Lift- pneumatic up / down Alignment accuracy: Frontside: Better than .5 micron Backside: 2 Micron Pneumatic controls: Substrate Mask Contact Cont Adj Chuck Lock N2 N2 Adj Options: Alignment / Exposure capability, 8" 500-2000 Watt MUV/DUV exposures Splitfield microscopes up to 500x Single-field microscopes up to 600x Infrared / visible alignment systems Differential micrometers, x,y & theta Model 150 digital intensity meter Custom vacuum chucks 200-2,000 watt NUV exposures Single-field zoom microscopes CCTV Alignment systems Fine mask rotation Vibration isolation tables Wavelength probes ` 110-220 VAC, 8 Amp CDA, 50 PSI 1/4" One-touch fitting Vacuum, 27" hg(continuous) 1/8" Barb fitting N2, 10 PSI 1/4" One-touch fitting Included: Stationary mask alignment module Uniform / Collimated 350 watt UV light source Intensity controlling power supply 6"x 6" Exposure beam with 365 / 400 nm Microscope motion with X, Y locking Vacuum mask holder Chuck 2000 vintage.
  • ABM: -

    ABM - Mask aligner, 8" W/O Multi-level optics Reliable mask alignment Exposure system delivers accurate Repeatable operation Flexibility require Accommodate wide range of materials Processes from odd sized substrates Small piece parts With exposures in Near UV Mid UV and Deep UV Fixed level or planarizing (Wedge compensation) vacuum chucks Low magnification single-field stereo zoom microscopes to low / high magnification single Splitfield microscopes with CCTV or Dual CCD alignment systems for visible / infrared alignment Single level system 2000 vintage.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
  • ABM: 1000

    ABM 1000 Semi-custom aligner with 2"-6" (some 8") Square wafer tooling Semi-automatic Motorized UV lamp column Power: dual 350 Watts, can be set to 500 Watts Air operated mask holder lift Nitrogen for wafer removal Floating table with 4 air shocks Micrometers adjust X-Y-Z and Theta Another micrometer adjusts mask to substrate distance 5 microns Valve with indicator adjusts contact: soft to hard contact: <1 micron lines and spaces routinely Also works in proximity no contact Mask holder for 7 X 7" Mask holder lifts automatically to remove wafer and speed production Throughput approx 30-40 wafers per hour Tooling for square round and rectangular wafers from 2-3-4-5-6" and some 8" wafers Includes: Zeiss Microscope: Split field filtered optics Magnification: 20-200 wide field Objectives 2X, 5X, 10X, 20X Eyepieces 10X wide field Variable power supply for microscope lamps Also can be adapted with video Accessories: Digital exposure timer: 0.1 second increments Small vacuum pump, 115AC Air or Nitrogen UV output / uniformity tester with sensor Static tester All tooling B / W video camera with 15" screen can replace Zeis Camera display UV intensity monitor dual PS Currently online Can be tested.
보여 주다 페이지 당
1 2 3 4 5 6 다음 것